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Photocatalytic removal of Ni (II) and Cu (II) by using different Semiconducting materials

Kamlesh M. Joshi, Bharat N. Patil, Dhanraj S. Shirsath and Vinod S. Shrivastava

The newest of which is photocatalysis with titanium dioxide, Zinc oxide and Cadmium sulphide which are used as semiconductors for the treatment. In this study, photocatalytic removal processes have been employed for the removal of Nickel and Copper at different pH. The maximum removal of Ni (II) and Cu (II) was observed at pH 4. The treatment tests were also accomplished with and without UV irradiation in both experiments. The effect of various parameters like equilibrium time, pH, dose of photocatalyst and metal ion concentration has been studied. The agitation time was kept constant (180 min). Results indicated that the optimum efficiencies of Ni (II) were 76.3% and Cu (II) was 88.4 % at pH 4 obtained by UV irradiation. On the other side without UV irradiation the percentage of removal of metal is very less.

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